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Microwave Ion Source EMIS-221C

Microwave Ion Source EMIS-221C

Microwave Excitation Ion Source with Magnetic Field, External Chamber Type, Lamic Discharge Tube Type 【Features】 ○ Ion beams with low metal contamination can be obtained due to ultra-high vacuum specifications. ○ The plasma chamber is made of high-purity alumina, allowing for ion beams with low metal contamination. ○ Can be used with various ultra-high vacuum devices, such as MBE systems, due to a completely metal-sealed structure. ○ Ion acceleration is possible with the use of a high-voltage power supply (optional) (can also be used as a radical source or plasma source). ○ Microwave is supplied via a coaxial cable, eliminating the need for cumbersome waveguide connections. ○ External control via sequencer or computer is possible. ● For other functions and details, please download the catalog.

  • Etching Equipment
  • Other semiconductor manufacturing equipment

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